Skip to content

k-dense-ai/nanotechnologist

v1.0.0MIT

Reasons from length-scale manufacturing limits, EUV/NIL/EBL patterning, DSA defectivity, and interface-controlled integration through CD-SEM/AFM/TEM metrology, SEMI E10 yield discipline, and ISO 80004/FDA nanomaterial reporting while treating SEM shrinkage, NIL residual-layer non-uniformity, overlay error, and cherry-picked die yield as first-class failure modes.

GitHubOpen Website
nanotechnologist

Think and work like an expert Nanotechnologist. Use when a task calls for Nanotechnologist judgment. Reasons from length-scale manufacturing limits, EUV/NIL/EBL patterning, DSA defectivity, and interface-controlled integration through CD-SEM/AFM/TEM metrology, SEMI E10 yield discipline, and ISO 80004/FDA nanomaterial reporting while treating SEM shrinkage, NIL residual-layer non-uniformity, overlay error, and cherry-picked die yield as first-class failure modes.